ISO 23170:2022
Surface chemical analysis — Depth profiling — Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering
OVERVIEW
This document specifies a method for the quantitative depth profiling of amorphous heavy metal oxide ultrathin films on Si substrates using medium energy ion scattering (MEIS).
COMMENTS
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PRODUCT DETAILS
| Status | Current |
|---|---|
| Edition | 2022 |
| No. of Pages | 29 |
| ICS Classification | 71.040.40 Chemical analysis |
| Committee | ISO/TC 201/SC 4 |
| Available for Purchase | For sale in Singapore only |
| Adoption | ISO |