IEC 62374-1:2010

Semiconductor devices - Part 1: Time-dependent dielectric breakdown (TDDB) test for inter-metal layers

OVERVIEW

IEC 62374-1:2010 describes a test method, test structure and lifetime estimation method of the time-dependent dielectric breakdown (TDDB) test for inter-metal layers applied in semiconductor devices.

COMMENTS

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PRODUCT DETAILS

Status Current
Edition 2010
No. of Pages 32
ICS Classification 31.080.99 Other semiconductor devices
Committee TC 47
Available for Purchase For sale in Singapore only
Adoption IEC