ISO 21859:2019
Fine ceramics (advanced ceramics, advanced technical ceramics) — Test method for plasma resistance of ceramic components in semiconductor manufacturing equipment
OVERVIEW
This document specifies a test method for plasma resistance of ceramic components in semiconductor manufacturing equipment. It is applicable to ceramic components of plasma-resistant components in dry etching chambers used in semiconductor manufacturing.
COMMENTS
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PRODUCT DETAILS
| Status | Current |
|---|---|
| Edition | 2019 |
| No. of Pages | 4 |
| ICS Classification | 81.060.30 Advanced ceramics |
| Committee | ISO/TC 206 |
| Available for Purchase | For sale in Singapore only |
| Adoption | ISO |