ISO 14606:2022
Surface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materials
OVERVIEW
This document gives guidance and requirements on the optimization of sputter-depth profiling parameters using appropriate single-layered and multilayered reference materials, in order to achieve optimum depth resolution as a function of instrument settings in Auger electron spectroscopy, X-ray photoelectron spectroscopy and secondary ion mass spectrometry.
This document is not intended to cover the use of special multilayered systems such as delta doped layers.
COMMENTS
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PRODUCT DETAILS
| Status | Current |
|---|---|
| Edition | 2022 |
| No. of Pages | 17 |
| ICS Classification | 71.040.40 Chemical analysis |
| Committee | ISO/TC 201/SC 4 |
| Available for Purchase | For sale in Singapore only |
| Adoption | ISO |