ISO 17331:2004
Surface chemical analysis — Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy
OVERVIEW
ISO 17331:2004 specifies chemical methods for the collection of iron and/or nickel from the surface of silicon-wafer working reference materials by the vapour-phase decomposition method or the direct acid droplet decomposition method.
It applies to iron and/or nickel atomic surface densities from 6 times 10 to the power 9 atoms per square centimetre to 5 times 10 to the power 11 atoms per square centimetre.
COMMENTS
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PRODUCT DETAILS
| Status | Current |
|---|---|
| Edition | 2004 |
| No. of Pages | 18 |
| ICS Classification | 71.040.40 Chemical analysis |
| Committee | ISO/TC 201 |
| Available for Purchase | For sale in Singapore only |
| Adoption | ISO |