ISO 19383:2026
Atomic layer deposition — Chemical characteristics and related process specifications of atomic layer deposition precursors
OVERVIEW
This document defines the chemical characteristics and related process specifications of atomic layer deposition precursors, including assay content, metal purity and anion content specification.
COMMENTS
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PRODUCT DETAILS
| Status | Current |
|---|---|
| Edition | 2026 |
| No. of Pages | 13 |
| ICS Classification | 25.220.01 Surface treatment and coating in general |
| Committee | ISO/TC 107 |
| Available for Purchase | For sale in Singapore only |
| Adoption | ISO : 0 |